日期:
来源:雅诚德英语网
CN films were deposited by radio frequency sputtering technique and the composition and structure of it were investigated by means of XPS, XRD and FTIR.
采用射频磁控溅射法沉积了CN薄膜,利用XPS,XRD, FTIR等测试手段研究了CN薄膜的成分和结构。
CN films were deposited by radio frequency sputtering technique and the composition and structure of it were investigated by means of XPS, XRD and FTIR.
采用射频磁控溅射法沉积了CN薄膜,利用XPS,XRD, FTIR等测试手段研究了CN薄膜的成分和结构。